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Deposition and Characterization of AlN and GaN Thin Films by Plasma-Enhanced Atomic Layer Deposition
DownloadSpring 2015
III-nitride semiconductors have a combination of structural characteristics and engineering properties that give them a unique place among semiconductors. The fact that they have the same crystal structure makes it possible to deposit alloys with fine-tuned band gaps from infrared to ultraviolet...
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Fall 2014
Gallium nitride (GaN) high-electron mobility transistors (HEMTs) have great potential for high-power and high-frequency applications, but current leakage issues compromise their reliability. This research focuses on developing GaN metal-oxide semiconductor field-effect transistors (MOSFETs),...
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Engineering Considerations for the Design of High Performance Zinc Oxide Thin Film Transistors
DownloadSpring 2018
Zinc oxide (ZnO) thin film transistors (TFTs) are garnering significant interest recently due to their unique combination of high optical transparency, moderately high electron mobility, good stability, and compatibility with low temperature processing. If a low temperature processed, high...
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Spring 2017
To enable scalable MOSFET technology in III-V semiconductor platforms, high quality semiconductor-oxide interfaces are essential. In this work, the role of surface reactions in the oxide deposition process is examined, with the objective of optimizing the thermodynamics of the semiconductor-oxide...
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Fall 2021
Growing demand for electrical energy calls for more efficient electronic devices not only in terms of performance but also in terms of energy-efficient fabrication processes. With traditional semiconductors (such as silicon) reaching their limits in electrical power handling, alternative...
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Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
Download2017-07-01
Motamedi, Pouyan, Bosnick, ken, Cui, Kai, Cadien, Ken, Hogan, James D.
There is a great interest in various branches of the advanced materials industry for the development of novel methods (and improvements to existing ones) for the deposition of conformal ultrathin metallic films. In most of these applications, like enhanced solar absorbers and microelectronics,...
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In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
Download2018-01-01
Motamedi, Pouyan, Bosnick, Ken, Cadien, Ken, Hogan, James D.
Ultrathin metal films have a wide variety of applications, especially in microelectronics. A key method to deposit these films is plasma-enhanced atomic layer deposition (PEALD), which is known for its ability to deposit thin films conformally and at relatively low temperatures. Building on the...
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Spring 2014
Analytical separations are important methods of identifying and quantifying molecular compounds present in complex sample mixtures. These approaches are popular in biochemistry, medical diagnostics, quality control, and numerous other applications. In these techniques, constituent analytes are...