Search
Skip to Search Results-
Fall 2012
Atomic layer deposition (ALD) is a powerful ultra-thin film deposition technique that uses sequential self-limiting surface reactions to provide conformal atomic scale film growth. Deposition of ALD films on many substrate systems has been studied before; however, limited data is available on...
-
Fall 2009
An experimental investigation of the mean scalar concentration field of jets into a uniform counterflow stream using planar laser induced fluorescence is presented. The centerline decay and radial spreading of the mean concentration field of the jet were investigated. Jet to counterflow velocity...
-
Fall 2017
Nanofabricated optically anisotropic uniaxial thin films with deep submicron feature sizes are emerging as potential platforms for low-loss all-dielectric meta-materials and for Dyakonov surface wave-based sub-wavelength optical confinement and guiding at interfaces with isotropic media. In this...