Fabrication of large area resonator arrays using nanoimprint lithography

• Author / Creator

  Janzen, Alexander Ryan

• This work investigates the use of nanoimprint lithography for creating nanoscale resonator devices for applications in mass sensing. A bilayer resist consisting of PMMA 495/LOR 3A allowed the ideal imprint yield for resonators with widths ranging from 300 nm down to 120 nm. Resonators with widths of 300 nm, lengths of 14 um, and thicknesses of 40 nm and 70 nm were fabricated with a yield approaching 100%. These devices were assayed, with resonant frequencies approaching 16.4 MHz and 21.6 MHz for the 40 and 70 nm thick devices respectively. Biotin-streptavidin was adsorbed onto the resonators, and the mass-per-area detected for the streptavidin protein was 0.78 mg/m^2 for the 40 nm thick beams, corresponding to 1 molecule per 128 nm^2. The mass-per-area for the 70 nm thick beams was determined to be 3.57 mg/m^2, corresponding to 1 protein per 21 nm^2.

• Subjects / Keywords

  • NEMS
  • Nanotechnology
  • Lithography
  • Resonators

• Graduation date

  Fall 2011

• Type of Item

  Thesis

• Degree

  Master of Science

• DOI

  https://doi.org/10.7939/R3P92X

• License

  This thesis is made available by the University of Alberta Libraries with permission of the copyright owner solely for non-commercial purposes. This thesis, or any portion thereof, may not otherwise be copied or reproduced without the written consent of the copyright owner, except to the extent permitted by Canadian copyright law.