SearchSkip to Search Results
2015 marks the 50th anniversary of Moore's law, which has described the exponential progress in semiconductor patterning technologies, enabling creation of smaller circuitry features at greater densities. These continued hardware developments, economically mass manufactured, have made possible...
The development of photolithography has been the main driving force of the semiconductor industry to keep pace with Moore’s Law for over five decades. The theoretical resolution limit of state-of-the-art 193 nm photolithography is about 36 nm (half pitch). By integrating multiple patterning...
Electron Beam Lithography (EBL) is a powerful tool for structuring materials at the deep nanoscale. Modeling and simulation of electron-beam interactions at this length scale is vital to understanding and optimizing nanofabrication using EBL. The low to high voltage (5 keV – 100 keV) regimes of...
This work investigates the use of nanoimprint lithography for creating nanoscale resonator devices for applications in mass sensing. A bilayer resist consisting of PMMA 495/LOR 3A allowed the ideal imprint yield for resonators with widths ranging from 300 nm down to 120 nm. Resonators with...
Hide and Seek is a children’s game. It can also be thought of more broadly as the act of concealment and of searching. The works in this exhibition ask viewers to consider the things from our past that we consciously and subconsciously hide as well as the objects and spaces in which we seek...
Views in Hudson’s Bay (1825) and Peter Rindisbacher: Constructions of Indigenous and non-Indigenous Culture in the Red River SettlementDownload
Within the Views in Hudson’s Bay (1825) print series are six hand-tinted lithographs depicting indigenous and non-indigenous culture in the Red River Settlement. The images engage with visual language from eighteenth- and nineteenth-century print series and travel books that construct North...