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Fall 2014
Interactions of finely dispersed abrasive particles in chemical mechanical planarization (CMP) slurries play a vital role in determining the polishing performance. In this study, coupled influence of hydrodynamic and colloidal interactions on the attachment of nanosized ceria (CeO2) particles to...
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Spring 2010
Heterogeneity of surfaces is often included in mathematical treatments of colloid transport and deposition as an afterthought, if at all. Most previous models of colloid transport and deposition have employed idealizations and simplifications such as assuming smooth collector surfaces with...