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Growth and Characterization of Metastable Hexagonal Nickel Thin Films via Plasma-Enhanced Atomic Layer Deposition
Download2017-07-01
Motamedi, Pouyan, Bosnick, ken, Cui, Kai, Cadien, Ken, Hogan, James D.
There is a great interest in various branches of the advanced materials industry for the development of novel methods (and improvements to existing ones) for the deposition of conformal ultrathin metallic films. In most of these applications, like enhanced solar absorbers and microelectronics,...
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In Situ Synchrotron X-Ray Diffraction Analysis of Phase Transformation in Epitaxial Metastable hcp Nickel Thin Films, Prepared via Plasma-Enhanced Atomic Layer Deposition
Download2018-01-01
Motamedi, Pouyan, Bosnick, Ken, Cadien, Ken, Hogan, James D.
Ultrathin metal films have a wide variety of applications, especially in microelectronics. A key method to deposit these films is plasma-enhanced atomic layer deposition (PEALD), which is known for its ability to deposit thin films conformally and at relatively low temperatures. Building on the...