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Skip to Search Results- 2E-beam
- 1Cold development
- 1Density multiplication
- 1Density multiplication of nanostructures
- 1EBL
- 1Electron beam lithography
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Spring 2010
A metal-insulator-metal (MIM) device is used to rectify high frequency radiation received through an antenna coupled to it. In this study, a Ta-SiO2-Ta MIM device was fabricated and characterized. SiO2 layers with different thicknesses of 2nm, 5nm and 8nm were deposited and evaluated both...
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Spring 2012
Electron Beam Lithography (EBL) is a powerful tool for structuring materials at the deep nanoscale. Modeling and simulation of electron-beam interactions at this length scale is vital to understanding and optimizing nanofabrication using EBL. The low to high voltage (5 keV – 100 keV) regimes of...