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Skip to Search Results- 3Atomic Layer Deposition
- 1ALD Process Optimization
- 1Catalyst
- 1Conducting Zirconium Nitride Growth
- 1Ellipsometry
- 1Energy Storage
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Fall 2012
Atomic layer deposition (ALD) is a powerful ultra-thin film deposition technique that uses sequential self-limiting surface reactions to provide conformal atomic scale film growth. Deposition of ALD films on many substrate systems has been studied before; however, limited data is available on...
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Atomic Layer Deposition of Transition Metal Oxide Coatings for Oxygen Catalysis at the Air Electrode in Zn-Air Batteries
DownloadFall 2024
Energy storage is a critical step in fully adopting renewable energy, such as wind and solar, and eliminating carbon emissions from fossil fuel use. Electrochemical batteries are a versatile energy storage system and, as the ubiquitous battery of today, Li-ion batteries (LIBs) have begun to...
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Low Temperature Plasma Enhanced Atomic Layer Deposition of Conducting Zirconium Nitride: In-situ growth characterization, recipe development, and the sources of oxygen contamination in films
DownloadSpring 2015
Atomic layer deposition (ALD) enables uniform and conformal deposition of sub-nanometer thick films over large substrate area, hence is the most suitable technique for deposition of critical features in modern semiconductor fabrication. Compared to other transition metal nitrides, reported...