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A study of the colloidal stability of mixed abrasive slurries of silica and ceria nanoparticles for chemical mechanical polishing
DownloadFall 2011
Slurry stability is an important factor in Chemical Mechanical Polishing (CMP) efficiency. However, few studies have been done in this respect. In settling tests at pH 4, adding various amounts of ceria to colloidal silica slurries was shown to change the stability of the resulted mixed abrasive...
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