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Skip to Search Results- 2Lithography
- 1Cold development
- 1Density multiplication
- 1Density multiplication of nanostructures
- 1E-beam
- 1EBL
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Fall 2011
This work investigates the use of nanoimprint lithography for creating nanoscale resonator devices for applications in mass sensing. A bilayer resist consisting of PMMA 495/LOR 3A allowed the ideal imprint yield for resonators with widths ranging from 300 nm down to 120 nm. Resonators with...
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Spring 2012
Electron Beam Lithography (EBL) is a powerful tool for structuring materials at the deep nanoscale. Modeling and simulation of electron-beam interactions at this length scale is vital to understanding and optimizing nanofabrication using EBL. The low to high voltage (5 keV – 100 keV) regimes of...