Deposition and characterization of thin alumina films grown by electron beam evaporation

• Author / Creator

  Muhammed, Harun

• In thin film fabrication, growth of high quality thin films with reproducibile properties is one of the main challenges. In order to achieve this goal, the influnce of the deposition system control parameters on film properties must be studied. This can be a complex process since many parameters may need to be considered. In this thesis, the electron beam evaporation of thin aluminum oxide films was investigated. Films were deposited with and without oxygen supply in the chamber, and at various ebeam source settings. A Varialble Angle Spectroscopic Ellipsometry system was used to characterize the films. Refractive index, which depends on material density and stoichiometry, was used as the figure of merit. It was observed that refractive index increases with deposition rate. Refractive index also changes with oxygen pressure and upon exposure to air. Various models to explain this behaviour are proposed and discussed.

• Subjects / Keywords

  • Electron beam deposition
  • Thin alumina films

• Graduation date

  Spring 2011

• Type of Item

  Thesis

• Degree

  Master of Science

• DOI

  https://doi.org/10.7939/R37726

• License

  This thesis is made available by the University of Alberta Libraries with permission of the copyright owner solely for non-commercial purposes. This thesis, or any portion thereof, may not otherwise be copied or reproduced without the written consent of the copyright owner, except to the extent permitted by Canadian copyright law.