Thin Film pH Measuring Device

• Author / Creator

  Luo, Jia

• This thesis presents research on the selection and development of thin film deposition of materials and initial data on the integration of a pH measuring
  device suitable for evaluation. This device used two particular tantalum compounds deposited by dc magnetron reactive sputtering as functional layers. Key parameters to film quality, such as resistivity, optical constants,
  composition, and pH response will be discussed in detail. Results indicated
  that nitrogen gas flow both controls the resistivity of sputtered tantalum nitride and suppressed the incorporation of oxygen. Variable Angle Spectroscopic Ellipsometer transmission scan on tantalum oxide with various oxygen pressure indicated insulating oxide forms only when the
  target enters oxide mode at 10+ sccm of oxygen flow. X-ray Photo-electron Spectroscopy surveys on tantalum oxide films showed that stoichiometric tantalum pentoxide was deposited. Preliminary result on pH response of the devices indicated the resistance increased with increasing pH.

• Subjects / Keywords

  • Ion conductor
  • TaN
  • Sputtering
  • XPS
  • Ta2O5

• Graduation date

  Fall 2011

• Type of Item

  Thesis

• Degree

  Master of Science

• DOI

  https://doi.org/10.7939/R3B983

• License

  This thesis is made available by the University of Alberta Libraries with permission of the copyright owner solely for non-commercial purposes. This thesis, or any portion thereof, may not otherwise be copied or reproduced without the written consent of the copyright owner, except to the extent permitted by Canadian copyright law.