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Theses and Dissertations
This collection contains theses and dissertations of graduate students of the University of Alberta. The collection contains a very large number of theses electronically available that were granted from 1947 to 2009, 90% of theses granted from 2009-2014, and 100% of theses granted from April 2014 to the present (as long as the theses are not under temporary embargo by agreement with the Faculty of Graduate and Postdoctoral Studies). IMPORTANT NOTE: To conduct a comprehensive search of all UofA theses granted and in University of Alberta Libraries collections, search the library catalogue at www.library.ualberta.ca - you may search by Author, Title, Keyword, or search by Department.
To retrieve all theses and dissertations associated with a specific department from the library catalogue, choose 'Advanced' and keyword search "university of alberta dept of english" OR "university of alberta department of english" (for example). Past graduates who wish to have their thesis or dissertation added to this collection can contact us at erahelp@ualberta.ca.
Items in this Collection
- 3Atomic Layer Deposition
- 1ALD Process Optimization
- 1Catalyst
- 1Conducting Zirconium Nitride Growth
- 1Ellipsometry
- 1Energy Storage
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Fall 2012
Atomic layer deposition (ALD) is a powerful ultra-thin film deposition technique that uses sequential self-limiting surface reactions to provide conformal atomic scale film growth. Deposition of ALD films on many substrate systems has been studied before; however, limited data is available on...
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Atomic Layer Deposition of Transition Metal Oxide Coatings for Oxygen Catalysis at the Air Electrode in Zn-Air Batteries
DownloadFall 2024
Energy storage is a critical step in fully adopting renewable energy, such as wind and solar, and eliminating carbon emissions from fossil fuel use. Electrochemical batteries are a versatile energy storage system and, as the ubiquitous battery of today, Li-ion batteries (LIBs) have begun to...
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Low Temperature Plasma Enhanced Atomic Layer Deposition of Conducting Zirconium Nitride: In-situ growth characterization, recipe development, and the sources of oxygen contamination in films
DownloadSpring 2015
Atomic layer deposition (ALD) enables uniform and conformal deposition of sub-nanometer thick films over large substrate area, hence is the most suitable technique for deposition of critical features in modern semiconductor fabrication. Compared to other transition metal nitrides, reported...