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Advanced methods in Glancing Angle Deposition to control thin film morphology, microstructure and texture
DownloadSpring 2014
Structuring of material on the nanoscale is enabling new functional materials and improving existing technologies. Glancing angle deposition (GLAD) is a physical vapor deposition technique that enables thin film fabrication with engineered columnar structures on the (10 to 100) nm scales. In this...
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Fall 2019
From the fabrication perspective, zinc oxide (ZnO) offers the possibility of thin film growth through the use of low-cost solution techniques. The solution-processed ZnO films, usually of polycrystalline formation, are suitable for use in field-effect transistors and in such applications as...
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2016-05-01
Recently ZnO has drawn a lot of attention in semiconductor industry due to its interesting features. High exciton binding energy, high resistivity against radiation, high breakdown voltage, insensitivity to visible light, and easy wet chemical etching are some of the interesting features of this...
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Fall 2016
Recently ZnO has drawn a lot of attention in semiconductor industry due to its interesting features. High exciton binding energy, high resistivity against radiation, high breakdown voltage, insensitivity to visible light, and easy wet chemical etching are some of the interesting features of this...