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Skip to Search Results- 2Wu, Nathanael Lap-Yan
- 1Aktary, Zackie M
- 1Binkhathlan, Ziyad
- 1Brandwein, Daniel
- 1Craik, Alison C
- 1Dobberthien, Brennen Jay
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Spring 2012
Fabrication of nanofeatures with precisely defined size and ordering is essential for a broad range of technologically important applications, including integrated circuit production. Self-organizing block copolymers are capable of patterning substrates with nanoscale precision. This thesis...
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Spring 2014
The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new...
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Spring 2014
The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new...
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Spectral Editing for Detection of Oncologically Relevant Metabolites with In-Vivo Magnetic Resonance Spectroscopy at 9.4 T
DownloadFall 2019
Short echo time (TE) magnetic resonance spectroscopy (MRS) techniques with spectral fitting are commonly employed approaches for brain metabolite quantification at 9.4 T. However, there is a significant overlap of peaks in short-TE spectra, even at 9.4 T. To better resolve resonances, spectral...
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Fall 2016
Nanoscale lithography on silicon is of interest for applications ranging from computer chip design to tissue interfacing. Block copolymer-based self-assembly, also called directed self-assembly (DSA) within the semiconductor industry, can produce a variety of complex nanopatterns on silicon, but...