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Skip to Search Results- 3Buriak, Jillian (Chemistry)
- 3Buriak, Jillian M. (Chemistry)
- 2Brett, Michael J. (Electrical and Computer Engineering)
- 2Choi, Phillip (Chemical and Materials Engineering)
- 2Lavasanifar, Afsaneh (Faculty of Pharmacy and Pharmaceutical Sciences)
- 1Brocks, Dion R. (Faculty of Pharmacy and Pharmaceutical Sciences)
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Spring 2012
Fabrication of nanofeatures with precisely defined size and ordering is essential for a broad range of technologically important applications, including integrated circuit production. Self-organizing block copolymers are capable of patterning substrates with nanoscale precision. This thesis...
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Spring 2014
The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new...
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Spring 2014
The impressive developments in the semiconductor industry over the past five decades have largely been dependent on the ability to continually reduce the dimensions of devices on a chip. However, as critical dimension requirements for these devices approach the limits of photolithography, new...
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Fall 2016
Nanoscale lithography on silicon is of interest for applications ranging from computer chip design to tissue interfacing. Block copolymer-based self-assembly, also called directed self-assembly (DSA) within the semiconductor industry, can produce a variety of complex nanopatterns on silicon, but...