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Fall 2015
2015 marks the 50th anniversary of Moore's law, which has described the exponential progress in semiconductor patterning technologies, enabling creation of smaller circuitry features at greater densities. These continued hardware developments, economically mass manufactured, have made possible...
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Fall 2017
The development of photolithography has been the main driving force of the semiconductor industry to keep pace with Moore’s Law for over five decades. The theoretical resolution limit of state-of-the-art 193 nm photolithography is about 36 nm (half pitch). By integrating multiple patterning...
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Spring 2022
Molecular self-assembly is the basis of structure in Nature. While of far less complexity than a natural system, the same physical rules apply to simple synthetic designed systems that spontaneously form self-assembled structures and patterns. The self-assembly of block copolymers (BCPs) is an...
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Spring 2010
Nanoscale patterning of organic molecules has received considerable attention in current nanoscience for a broad range of technological applications. In order to provide a viable approach, this thesis describes catalytic stamp lithography, a novel soft-lithographic process that can easily...
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Spring 2012
Fabrication of nanofeatures with precisely defined size and ordering is essential for a broad range of technologically important applications, including integrated circuit production. Self-organizing block copolymers are capable of patterning substrates with nanoscale precision. This thesis...
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Fall 2016
Nanoscale lithography on silicon is of interest for applications ranging from computer chip design to tissue interfacing. Block copolymer-based self-assembly, also called directed self-assembly (DSA) within the semiconductor industry, can produce a variety of complex nanopatterns on silicon, but...