Studying the collapse of photoresist patterns during photolithography process

• Pattern collapse in photolithography process

• Author / Creator

  Chini, Seyed Farshid

• Subjects / Keywords

  • Photolithography.
  • Nanotechnology.
  • Microlithography.
  • Nanoelectromechanical systems.

• Graduation date

  2008

• Type of Item

  Thesis

• Degree

  Master of Science

• DOI

  https://doi.org/10.7939/r3-dpdp-xm88

• License

  This thesis is made available by the University of Alberta Libraries with permission of the copyright owner solely for the purpose of private, scholarly or scientific research. This thesis, or any portion thereof, may not otherwise be copied or reproduced without the written consent of the copyright owner, except to the extent permitted by Canadian copyright law.