SearchSkip to Search Results
2015 marks the 50th anniversary of Moore's law, which has described the exponential progress in semiconductor patterning technologies, enabling creation of smaller circuitry features at greater densities. These continued hardware developments, economically mass manufactured, have made possible...
SEM Images of Block Copolymer Templated Patterns from PS-b-P2VP on Silicon with Platinum for Testing with ADAblock
SEM Images of Block Copolymer Templated Patterns from PS-b-P2VP on Silicon with Platinum for Testing with ADAblockDownload
Scanning electron microscope (SEM) images of patterns derived from polystyrene-block-poly(2-vinylpyridine), where the poly(2-vinylpyridine) domains replaced with platinum metal. All samples were annealed for 20 minutes at 200 degrees celsius. Polymers used include PS(23.6k)-b-P2VP(10.4k),...