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Skip to Search Results- 26Thin films
- 24Nanotechnology
- 13Nanostructures
- 12Glancing angle deposition
- 4Block copolymers
- 4Lithography
- 2Wu, Nathanael Lap-Yan
- 1Achal, Roshan
- 1Adeyenuwo, Adegboyega P.
- 1Adl, Ahmad H
- 1Bezuidenhout, Louis Wentzel
- 1Bhuiyan, Abuhanif
- 52Graduate and Postdoctoral Studies (GPS), Faculty of
- 52Graduate and Postdoctoral Studies (GPS), Faculty of/Theses and Dissertations
- 1Digital Humanities Program
- 1Digital Humanities Program/Journal Articles (Digital Humanities)
- 1Helmholtz-Alberta Initiative
- 1Helmholtz-Alberta Initiative/Journal Articles & Research Abstracts (Helmholtz-Alberta Initiative)
- 28Department of Electrical and Computer Engineering
- 8Department of Physics
- 7Department of Chemical and Materials Engineering
- 4Department of Chemistry
- 2Department of Mechanical Engineering
- 1Department of Resource Economics and Environmental Sociology
- 6Brett, Michael (Electrical and Computer Engineering)
- 5Brett, Michael J. (Electrical and Computer Engineering)
- 3Buriak, Jillian M. (Chemistry)
- 3Sit, Jeremy (Electrical and Computer Engineering)
- 2Evoy, Stephane (Electrical and Computer Engineering)
- 2Mitlin, David (Chemical and Materials Engineering)
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Spring 2010
Thin films are produced from layers of materials ranging from nanometres to micrometres in height. They are increasingly common and are being used in integrated circuit design, optical coatings, protective coatings, and environmental sensing. Thin films can be fabricated using a variety of...
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Advanced methods in Glancing Angle Deposition to control thin film morphology, microstructure and texture
DownloadSpring 2014
Structuring of material on the nanoscale is enabling new functional materials and improving existing technologies. Glancing angle deposition (GLAD) is a physical vapor deposition technique that enables thin film fabrication with engineered columnar structures on the (10 to 100) nm scales. In this...
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Fall 2015
2015 marks the 50th anniversary of Moore's law, which has described the exponential progress in semiconductor patterning technologies, enabling creation of smaller circuitry features at greater densities. These continued hardware developments, economically mass manufactured, have made possible...
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Spring 2010
The purpose of this research was to study the applicability of management system standards (MSSs) in a research and development (R&D)-oriented nanotechnology setting. Since multiple quality and R&D-specific standards were found to be relevant in such environments, a methodology for the...
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Fall 2012
Atomic layer deposition (ALD) is a powerful ultra-thin film deposition technique that uses sequential self-limiting surface reactions to provide conformal atomic scale film growth. Deposition of ALD films on many substrate systems has been studied before; however, limited data is available on...
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Fall 2014
This research examines the applications of novel technologies (nanotechnology and genomics) and the public’s purchasing intentions in the Canadian food industry (national online surveys). Canadian consumers’ preferences and their willingness to pay for four hypothetical products treated with two...
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Comparative analysis, modeling and simulation of Nanocrystal synthesis by Physical Vapor Deposition methods
DownloadFall 2011
Nanotechnology is rapidly becoming one of the most influential frontiers of technology. Nanocrystal (NC) synthesis is potentially one of the central processes in nanoelectronics due to its ability to improve performance of electronics devices. Physical vapor deposition (PVD) is one of the most...
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Deposition and Characterization of AlN and GaN Thin Films by Plasma-Enhanced Atomic Layer Deposition
DownloadSpring 2015
III-nitride semiconductors have a combination of structural characteristics and engineering properties that give them a unique place among semiconductors. The fact that they have the same crystal structure makes it possible to deposit alloys with fine-tuned band gaps from infrared to ultraviolet...