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Permanent link (DOI): https://doi.org/10.7939/R3SB0F

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The Influence of Sputtering Pressure and Film Thickness on Metal Resistivity Open Access

Descriptions

Other title
Subject/Keyword
Resistivity
Argon Pressure
Sputtering
Type of item
Thesis
Degree grantor
University of Alberta
Author or creator
Xu, Can
Supervisor and department
Dr. Kenneth Cadien (Chemical and Materials Engineering)
Examining committee member and department
Dr. Douglas Barlage (Electrical and Computer Engineering)
Dr. David Mitlin (Chemical and Materials Engineering)
Department
Department of Chemical and Materials Engineering
Specialization

Date accepted
2010-04-13T19:40:30Z
Graduation date
2010-06
Degree
Master of Science
Degree level
Master's
Abstract
Electrical resistivity is an important indicator of metal thin film quality. In this study, the influence of argon working pressure on the properties of metal thin films was evaluated, and the thickness effect on the resistivity of metal thin films was investigated. The sputtered thin film resistivity performances of seven metals as a function of argon pressure were measured, and the results turned out that the argon pressure was vital to film quality. Further investigation on sputtered chromium thin films using XRD, SEM and XPS revealed that the argon pressure influences the microstructure of sputtered metal thin films. Different microstructure is the reason for different resistivity performances, and John Thornton's "Zone Model" explains all these behaviours well. The resistivity of aluminum and chromium thin films with thickness from 15 to 150 nm were compared, the resistivity change significantly. The scaling trends are different for different metals.
Language
English
DOI
doi:10.7939/R3SB0F
Rights
License granted by Can Xu (cxu1@ualberta.ca) on 2010-04-13T16:50:03Z (GMT): Permission is hereby granted to the University of Alberta Libraries to reproduce single copies of this thesis and to lend or sell such copies for private, scholarly or scientific research purposes only. Where the thesis is converted to, or otherwise made available in digital form, the University of Alberta will advise potential users of the thesis of the above terms. The author reserves all other publication and other rights in association with the copyright in the thesis, and except as herein provided, neither the thesis nor any substantial portion thereof may be printed or otherwise reproduced in any material form whatsoever without the author's prior written permission.
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