ERA

Download the full-sized PDF of Fabrication of Nanostructures by Low Voltage Electron Beam LithographyDownload the full-sized PDF

Actions

Download  |  Analytics

Export to: EndNote  |  Zotero  |  Mendeley

Communities

This file is in the following communities:

Faculty of Graduate Studies and Research

Collections

This file is in the following collections:

Theses and Dissertations

Fabrication of Nanostructures by Low Voltage Electron Beam Lithography Open Access

Descriptions

Other title
Subject/Keyword
fragmentation of PMMA
EBL
cold development
polymethylmethacrylate
lithography
monte carlo simulation
density multiplication of nanostructures
model of exposure of PMMA
electron beam lithography simulator
negative-tone tone resist
PMMA
positive-tone tone resist
model of development
nanofabrication
nanostructure
electron beam lithography
e-beam
density multiplication
Type of item
Thesis
Degree grantor
University of Alberta
Author or creator
Adeyenuwo, Adegboyega P.
Supervisor and department
Stepanova, Maria (Electrical and Computer Engineering, National Insitute for Nanotechnology)
Dew, Steve K. (Electrical and Computer Engineering)
Examining committee member and department
Sit, Jeremy (Electrical and Computer Engineering)
Stepanova, Maria (Electrical and Computer Engineering, National Insitute for Nanotechnology)
Dew, Steve K. (Electrical and Computer Engineering)
Cadien, Kenneth (Chemical and Materials Engineering)
Department
Department of Electrical and Computer Engineering
Specialization
Micro-Electro-Mechanical Systems (MEMS) & Nanosystems
Date accepted
2012-01-06T09:15:46Z
Graduation date
2012-06
Degree
Master of Science
Degree level
Master's
Abstract
Electron Beam Lithography (EBL) is a powerful tool for structuring materials at the deep nanoscale. Modeling and simulation of electron-beam interactions at this length scale is vital to understanding and optimizing nanofabrication using EBL. The low to high voltage (5 keV – 100 keV) regimes of EBL have been studied for decades. However, the ultra-low regime (
Language
English
Rights
Permission is hereby granted to the University of Alberta Libraries to reproduce single copies of this thesis and to lend or sell such copies for private, scholarly or scientific research purposes only. Where the thesis is converted to, or otherwise made available in digital form, the University of Alberta will advise potential users of the thesis of these terms. The author reserves all other publication and other rights in association with the copyright in the thesis and, except as herein before provided, neither the thesis nor any substantial portion thereof may be printed or otherwise reproduced in any material form whatsoever without the author's prior written permission.
Citation for previous publication
Density multiplication of nanostructures fabricated by ultralow voltage electron beam lithography using PMMA as positive- and negative-tone resist Adegboyega P. Adeyenuwo, Maria Stepanova, and Steven K. Dew, J. Vac. Sci. Technol. B 29, 06F312 (2011), DOI:10.1116/1.3657512

File Details

Date Uploaded
Date Modified
2015-08-05T19:54:40.975+00:00
Audit Status
Audits have not yet been run on this file.
Characterization
File format: pdf (Portable Document Format)
Mime type: application/pdf
File size: 4938628
Last modified: 2015:10:12 19:33:48-06:00
Filename: Adeyenuwo_Paul_Spring 2012 .pdf
Original checksum: ced3dd6287875d98c8178e6bbc5f1b11
Well formed: true
Valid: true
File title: {{}}
File author: PAUL ADEYENUWO
Page count: 119
File language: en-CA
Activity of users you follow
User Activity Date